The PNF features state of the art equipment for processes involving photolithography, electron beam lithography, and direct write lithography.  Linewidth capabilities range from 8 nm to mm scale features. PNF Lithography tools are used for a variety of purposes including R & D mask making, 3D grayscale lithographic patterning and Nabity Nanometer Pattern Generation (via NPGS). 

3C Technical GCA AutoStep 200 5x Reduction Stepper

The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment.

FEI Quanta 650 FEG SEM with Nabity Pattern Generator

The FEI Quanta 650 FEG SEM (Scanning Electron Microscope) is a variable pressure microscope used for high resolution imaging. It is capable of resolving features on a scale of less than 5 nm. It is equipped with a Field Emission Gun (FEG) which allows for bright-field and dark-field sample imaging. The SEM is equipped with a total of 8 detectors for the purpose of imaging and analysis as well as a Nabity Nanometer Pattern Generation System (NPGS) which allows for advanced electron beam lithography by means of the SEM.

Heidelberg MLA150 Direct Write Lithographer

The Heidelberg Direct Write Lithography system is a flexible, high resolution pattern generator for direct writing.  The MLA150 creates the design and exposes it directly onto a wafer, no photomask is necessary. The system features environmental control, temperature stabilization, backside alignment, and a 150 x 150 mm2 exposure area. 

Raith EBPG5000 Plus E-Beam Writer

The Raith EBPG5200 E-Beam lithography system is a high performance nanolithography system used chiefly for write lithography system used chiefly for write lithography and R&D mask making. It is the latest model in the EBPG series, preceded by the EBPG5150.

SUSS MJB4 Manual Mask Aligner

The MJB4 is a high precision manual mask aligner that works with small substrates, wafers, and pieces. It is frequently used for MEMS and optoelectronic applications. It can handle fragile III-V materials.

YES-58TA Vacuum Bake/HMDS Vapor Prime and Image Reversal System

The YES Vapor Prime and Image Reversal Oven utilizes NHvapor to allow the creation of negative images using a positive photo-resist.