The PNF features state of the art equipment for processes involving photolithography, electron beam lithography, and direct write lithography. Linewidth capabilities range from 8 nm to mm scale features. PNF Lithography tools are used for a variety of purposes including R & D mask making, 3D grayscale lithographic patterning and Nabity Nanometer Pattern Generation (via NPGS).
- 3C Technical GCA AutoStep 200 5x Reduction Stepper
The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment.
- FEI Quanta 650 FEG SEM with Nabity Pattern Generator
The FEI Quanta 650 FEG SEM (Scanning Electron Microscope) is a variable pressure microscope used for high resolution imaging. It is capable of resolving features on a scale of less than 5 nm. It is equipped with a Field Emission Gun (FEG) which allows for bright-field and dark-field sample imaging. The SEM is equipped with a total of 8 detectors for the purpose of imaging and analysis as well as a Nabity Nanometer Pattern Generation System (NPGS) which allows for advanced electron beam lithography by means of the SEM.
- Heidelberg MLA150 Direct Write Lithographer
The Heidelberg Direct Write Lithography system is a flexible, high resolution pattern generator for direct writing. The MLA150 creates the design and exposes it directly onto a wafer, no photomask is necessary. The system features environmental control, temperature stabilization, backside alignment, and a 150 x 150 mm2 exposure area.
- Raith EBPG5000 Plus E-Beam Writer
The Raith EBPG5200 E-Beam lithography system is a high performance nanolithography system used chiefly for write lithography system used chiefly for write lithography and R&D mask making. It is the latest model in the EBPG series, preceded by the EBPG5150.
- SUSS MJB4 Manual Mask Aligner
The MJB4 is a high precision manual mask aligner that works with small substrates, wafers, and pieces. It is frequently used for MEMS and optoelectronic applications. It can handle fragile III-V materials.
- YES-58TA Vacuum Bake/HMDS Vapor Prime and Image Reversal System
The YES Vapor Prime and Image Reversal Oven utilizes NH3 vapor to allow the creation of negative images using a positive photo-resist.