Overview
The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment.
3C Technical GCA AutoStep 200 5x Reduction Stepper
Key Features
21 mm dia exposure field (up to 14.8 X 14.8 mm square)
Can achieve resolution < 600 nm
200 mm wafer stage
Stage precision < 100 nm
Accommodates wafer sizes from 1 cm pieces to 6” wafers
Automatic reticle transfer alignment through RMS (reticle management system)
Exposure wavelength of 365 nm
Key Applications
MEMS
VLSI
Contact
Jered Feldman
Process Manager
+1 (773) 834-7564
Check Availability
Already have an account?
Reserve this tool with the Online Tool Manager.
Need an Account?
Equipment Fee
Tier 0
