Overview
The Raith EBPG5200 E-Beam lithography system is a high-performance nanolithography system used chiefly for write lithography and R&D mask making. It is the latest model in the EBPG series, preceded by the EBPG5150.
Raith EBPG5000 Plus E-Beam Writer
Key Features
155 mm writing capability
Accommodates wafer sizes of up to 6” and mask sizes of up to 6”
Minimum feature size of less than 8 nm
50 / 100 MHz pattern generator
Thermal Field Emission gun, for operation at 20, 50, and 100 kV
Variable field size to 1 mm at all kVs
Key Applications
Compound semiconductor application
Vertical resonant tunnel transistor
Circular grating resonator
Contact
Jered Feldman
Process Manager
+1 (773) 834-7564
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Equipment Fee
Tier 4
