Overview
The WAFAB Manual Developer Bench is a non-automated front-access wet bench designed to handle chemicals used for developing photoresist.
The WAFAB Manual Developer Bench is a non-automated front-access wet bench designed to handle chemicals used for developing photoresist.
PVDF deck top
PFA Nitrogen/DI Water spray gun set
Spin processor for substrate sizes 10 mm-150 mm
Photoresist development