Overview
The WAFAB Manual Developer Bench is a non-automated front-access wet bench designed to handle chemicals used for developing photoresist.
WAFAB Developer Bench
Key Features
- PVDF deck top
- PFA Nitrogen/DI Water spray gun set
- Spin processor for substrate sizes 10 mm-150 mm
Key Applications
- Photoresist development
Contact
Jered Feldman
Process Manager
+1 (773) 834-7564
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Equipment Fee
Tier 0
