AZ P4620 Photoresist

Overview

The AZ P4620 Photoresist is a photoresist with improved adhesion to most common substrates and is used in wet etching and plating processes. It has a low photo active compound concentration which allows for the application of thick resist films.

Features

g - , h - and i - line sensitive
Film thicknesses of 6 - 20 μm
Steep wall profiles and high aspect ratios
Compatible with AZ 400K Developer, AZ 726 MIF Developer

Hazards

Flammable liquid and vapour
Serious eye irritation
May cause respiratory irritation, drowsiness, dizziness

Safety

Keep away from heat, sparks, open flames and hot surfaces
Take precautionary measures against static discharge
Wear chemical resistant eye protection, protective gloves and clothing

General Documentation

Storage and Waste

Storage: FLAM 1
Waste: SOL 1 & 2, PR 1 & 2

Related Equipment

WAFAB Developer Bench