Tystar Mini-Tytan 4600 Furnace System


The Tystar Mini-Tytan 4600 Furnace system is designed for diffusion, oxidation, and LPCVD applications. The system consists of four vacuum tubes in one furnace stack. Two of these are atmospheric pressure tubes and the other two are low-pressure tubes. The Tystar 4600 can perform low-temperature oxide processes and the deposition of materials such as silicon nitride and polysilicon. The Tystar 4600 offers high process uniformity and incorporates some of the most advanced concepts in high-performance wafer processing.

Key Features

Key Applications

General Documentation