The IoN Wave 10 Plasma Asher is a mid-size wafer batch plasma microwave asher used for the removal of photoresists from etched wafers, wafer descum, and wafer cleaning prior to wet etching, among other applications. It is capable of high photoresist ashing rates with minimal exposure to electro static discharge (ESD).
Quartz chamber taking wafers to 8”
Quartz boats taking up to 25 6” wafers
2.45 GHz frequency with power output up to 600 W
Graphic User Interface (GUI) software compliant with Semi E95 - 1101
10.4” LCD touch panel
Recipe editor for fast, versatile parameter control
Recipe editor simulator software
Remote process monitoring via Ethernet
Photo-resist stripping
Wafer descum
Wafer cleaning
SU-8 removal
Etching of passivation layers
Cleaning of filters and membranes
Chemical trace analysis
MEMS
Photonics
