IoN Wave 10 Plasma Asher
Overview
The IoN Wave 10 Plasma Asher is a mid-size wafer batch plasma microwave asher used for the removal of photoresists from etched wafers, wafer descum, and wafer cleaning prior to wet etching, among other applications. It is capable of high photoresist ashing rates with minimal exposure to electro static discharge (ESD).
Key Features
- Quartz chamber taking wafers to 8”
- Quartz boats taking up to 25 6” wafers
- 2.45 GHz frequency with power output up to 600 W
- Graphic User Interface (GUI) software compliant with Semi E95 - 1101
- 10.4” LCD touch panel
- Recipe editor for fast, versatile parameter control
- Recipe editor simulator software
- Remote process monitoring via Ethernet
Key Applications
- Photo-resist stripping
- Wafer descum
- Wafer cleaning
- SU-8 removal
- Etching of passivation layers
- Cleaning of filters and membranes
- Chemical trace analysis
- MEMS
- Photonics
General Documentation
- Related Equipment Categories
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