The AJA ATC Orion 8 UVH Sputtering System is a PVD tool which deposits films on a substrate using magnetron sputtering. Magnetron sputtering uses accelerated, positively charged ions from a plasma source to deposit films with an increased deposition rate and more controlled election bombardment than evident in other sputtering systems (such as diode sputtering).
Stiletto (HV) magnetron sputtering source
A330-XP-O (UHV) magnetron sputtering source
Turbo-pumped vacuum load lock with 6 position cassette
Substrates to 6”
Capable of reactive sputtering with oxygen & nitrogen
DC and RF generators
Up to 5 3” sputter sources, RF bias option
Phase II-J Computer Control System
Corrosion resistant coatings
Low friction coatings
Hard, wear resistant coatings
Coatings with specific electrical and optical properties
Tier 0
