This is a list of approved, regularly stocked liquid chemicals. Please click on a specific chemical to be linked to the Safety Data Sheet (SDS).
- Acetic Acid
- Acetone
- ALPAD Etch 639, Transene
- Aluminum Etchant Type A, Transene
- Ammonium Hydroxide
- Amyl Acetate
- Anisole
- AR 300-80, Allresist
- AR-N 7520, Allresist
- AR-P 6200, Allresist
- AR-PC 5090, Allresist
- AZ 300 MIF Developer, Merck
- AZ 340 Developer, Merck
- AZ 400K Developer, Merck
- AZ 726 MIF Developer, Merck
- AZ 1505 Photoresist, Merck
- AZ 1512 Photoresist, Merck
- AZ 1518 Photoresist, Merck
- AZ 5214-E IR Photoresist, Merck
- AZ Developer 1:1, Merck
- AZ EBR Solvent, Merck
- AZ MIR 703 Resist 14cPs, Merck
- AZ nLOF 2020 Photoresist, Merck
- AZ nLOF 2070 Photoresist, Merck
- AZ NMP Rinse, Merck
- AZ P4620 Photoresist, Merck
- AZ 40XT-11D, Merck
- AZ 50XT, Merck
- Buffer HF Improved, Transene
- Chromium Mask Etchant CE-5M, Transene
- Copper Etchant CE-100, CE-200, Transene
- Cyclopentanone
- Gold Etchant Type TFA, Transene
- Hexamethyl Disilazane (HMDS)
- HSQ
- Hydrochloric Acid
- Hydrofluoric Acid, 49%
- Hydrogen Peroxide, 30%
- Isopropyl Alcohol
- LOR 3A, 5A Series Resists, Kayaku
- Methanol
- MIBK
- MMA EL6, EL9l EL11, EL13, Kayaku
- NanoStrip
- Nickel Etch TFB, Transene
- O-Phospho Acid
- 495 PMMA A2, A4, A6, A8, Kayaku
- 950 PMMA A2, A4, A7, A11, Kayaku
- Potassium Hydroxide, 30%
- Potassium Hydroxide, 45%
- SU-8 Developer, Kayaku
- SU-8 2000 Series, Kayaku
- SU-8 3000 Series, Kayaku
- Sulfuric Acid
- Tantalum Etch 1-1-1, Transene
- Tetramethylammonium Hydroxide, 25% (TMAH)
- Toluene
- Xylenes