All substrate and film properties can all be measured in the PNF utilizing, among others, our AFM and SEM.  Determining properties such as stress, thickness, and surface roughness allows users to customize their materials to meet the application.

AZ 5214 IR Photoresist

The AZ 5214E Image Reversal Photoresist is a special photoresist intended for lift-off-techniques which call for a negative wall profile, although the AZ 5214E is a positive resist it can be used effectively in IR creating a negative pattern of a mask.