Plasma-Therm Apex SLR HDPCVD
Overview
The Plasma-Therm Apex SLR is a High Density Plasma Chemical Vapor Deposition (HDPCVD) system. It uses an Inductively Coupled Plasma (ICP) source to generate higher density plasma than a PECVD system providing deposition at lower temperatures for higher quality, low temperature films.
Key Features
1 kW 2 MHz ICP source
300 W, 13.56 MHz electrode
254 mm plate
Low temperature deposition, typically 80 ° - 150 °C
Liquid-to-liquid heat exchanger
Compatible with film etching for SiNx, SiO2, a-Si, SiOxNy, SiC, Ta2O5.
Compatible with film etching for polymers such as photoresist and polyimide
Endpoint Detection
ANSI-ISA 88 data logging and recipe management software
Key Applications
Failure/Yield Analysis
Silicon conductors
Photonics
ICP etch processing
MEMS
Solid State Lighting
R & D
Dielectrics
Polymers
General Documentation
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