AZ nLOF 2020 Photoresist

Overview

The AZ nLOF 2020 Photoresist is an i-line photoresist designed to simplify complex lift-off lithography processes. The nLOF 2020 Photoresist works well in both surfactant and non-surfactant containing tetramethylammonium hydroxide (TMAH) developers. 

Features

Hazards

Safety

General Documentation

Storage and Waste

Related Equipment