AZ 5214 IR Photoresist
Overview
The AZ 5214E Image Reversal Photoresist is a special photoresist intended for lift-off-techniques which call for a negative wall profile, although the AZ 5214E is a positive resist it can be used effectively in IR creating a negative pattern of a mask.
Features
- Resist film thickness of approximately 1.0 - 2.0 μm
- h- and i-line sensitive at 310 - 420 nm, not g-line sensitive
- Developed structure stable up to 130 °C
- Compatible with AZ 300 Developer and AZ 726 MIF Developer
Hazards
- Serious eye irritation
- Flammable liquid and vapor
- May cause respiratory irritation
Safety
- Keep away from heat/sparks/open flames/hot surfaces
- Take precautionary measures against static discharge
- No smoking
- Keep container tightly closed
- Wash skin thoroughly after handling
- Wear chemical resistant eye protection, protective gloves and clothing
General Documentation
Storage and Waste
- Storage: FLAM 1
- Waste: SOL 1 & 2, PR 1 & 2
Related Equipment
- Related Process Categories
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