Wet Etching

A wide range of specialized wet benches suitable for wet etching processes including dedicated hoods for HF and other toxic materials.

AZ 1518 Photoresist

The AZ 1518 Photoresist is a Photoresist of elevated film thickness used for improved stability resist masks in wet etching processes.

AZ 300T Stripper

AZ 300T is a high performance photoresist stripper containing alkaline additive that leaves substrate surfaces clean of organic contaminants. 

AZ MiR 703 Positive Photoresist

The AZ MiR 703 Positive Photoresist is a medium resolution i-line sensitive Photoresist optimized for line and contact hole pattern layers. 

AZ P4110 Photoresist

The AZ P4110 Photoresist is a photoresist with improved adhesion to most common substrates and is used in wet etching and plating processes. It has a low photo active compound concentration which allows for the application of thick resist films. 

AZ P4330 Photoresist

The AZ P4330 Photoresist is a photoresist with improved adhesion to most common substrates and is used in wet etching and plating processes. It has a low photo active compound concentration which allows for the application of thick resist films.

AZ P4620 Photoresist

The AZ P4620 Photoresist is a photoresist with improved adhesion to most common substrates and is used in wet etching and plating processes. It has a low photo active compound concentration which allows for the application of thick resist films.