Wet Etching
A wide range of specialized wet benches suitable for wet etching processes including dedicated hoods for HF and other toxic materials.
-
Solvent Benches
-
Photoresist Benches
-
Develop Benches
-
HF/TMAH Bench
-
Acid/Base Bench
-
Toxic/Corrosive Bench
- RCA Cleaning Bench
- AZ 1518 Photoresist
The AZ 1518 Photoresist is a Photoresist of elevated film thickness used for improved stability resist masks in wet etching processes.
- AZ 300T Stripper
AZ 300T is a high performance photoresist stripper containing alkaline additive that leaves substrate surfaces clean of organic contaminants.
- AZ MiR 703 Positive Photoresist
The AZ MiR 703 Positive Photoresist is a medium resolution i-line sensitive Photoresist optimized for line and contact hole pattern layers.
- AZ P4620 Photoresist
The AZ P4620 Photoresist is a photoresist with improved adhesion to most common substrates and is used in wet etching and plating processes. It has a low photo active compound concentration which allows for the application of thick resist films.